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Ion-Enhanced Etching of Si(100) with Molecular Chlorine:  Neutral and Ionic Product Yields as a Function of Ion Kinetic Energy and Molecular Chlorine Flux

TitleIon-Enhanced Etching of Si(100) with Molecular Chlorine:  Neutral and Ionic Product Yields as a Function of Ion Kinetic Energy and Molecular Chlorine Flux
Publication TypeJournal Article
Year of Publication2000
AuthorsMaterer, N, Goodman, RS, Leone, SR
JournalThe Journal of Physical Chemistry B
Volume104
Issue14
Pagination3261 - 3266
Date PublishedJan-04-2000
ISSN1520-6106
DOI10.1021/jp993278q
Short TitleJ. Phys. Chem. B